Annealing and amorphous silicon passivation of porous silicon with blue light emission

Y ZHAO,D YANG,D LI,M JIANG
DOI: https://doi.org/10.1016/j.apsusc.2005.01.176
IF: 6.7
2005-01-01
Applied Surface Science
Abstract:The photoluminescence (PL) of the annealed and amorphous silicon passivated porous silicon with blue emission has been investigated. The N-type and P-type porous silicon fabricated by electrochemical etching was annealed in the temperature range of 700–900°C, and was coated with amorphous silicon formed in a plasma-enhanced chemical vapor deposition (PECVD) process. After annealing, the variation of PL intensity of N-type porous silicon was different from that of P-type porous silicon, depending on their structure. It was also found that during annealing at 900°C, the coated amorphous silicon crystallized into polycrystalline silicon, which passivated the irradiative centers on the surface of porous silicon so as to increase the intensity of the blue emission.
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