Ultraviolet light emission from porous silicon with its peak wavelength around 370 nm.

Jun Lin,GuangQing Yao,Jiaqi Duan,Guogang Qin
1995-01-01
Abstract:Ultraviolet light with a peak wavelength around 370 nm is observed from thermally oxidized porous silicon which is formed under a certain condition. The intensity of the ultraviolet light varies with the oxidation temperature and reaches a maximum at 1000��C, and gets very weak after oxidation has been carried out at 1150��C for 5 min and silicon nanoparticles in porous silicon have disappeared. The peak position energy of ultraviolet light does not depend on the oxidation temperature except that a new peak around 360 nm appears in addition to the 370nm peak for porous silicon oxidized at 1000��C. Presuming that the photoexcitation and the light emission mainly occurs respectively inside the silicon nanoparticle in porous silicon and in two or more types of luminescence centers in SiO2 layers covering silicon nanoparticles, the experimental results can well be explained.
What problem does this paper attempt to address?