Study on Etching of ZnGeP2 Single Crystals

张羽,赵北君,朱世富,陈宝军,何知宇,孙永强,程江,梁栋程
DOI: https://doi.org/10.16553/j.cnki.issn1000-985x.2010.02.020
2010-01-01
Abstract:A novel etchant and etching process for ZnGeP2 crystals was presented.The wafers were treated through grinding,mechanical polishing and hot chemical polishing in the solution of HCl + HNO3.Then the wafers were etched in the etching solution of HF(40%)∶HNO3(65%)∶CH3COOH(99.5%)∶H2O∶I2=2 mL∶2 mL∶1 mL∶1 mL∶4 mg for 8 min at room temperature with vibration by ultrasonic.The etching pits were clearly observed in SEM.The etching pits of(110) faces are quadrangle and that of(204) faces are pentagon.The etching pit density is about 104/cm2.The formation of the two kinds of etch pits is theoretically analyzed.
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