Evolution of Structure and Properties of Multi-Component (Alcrtatizr)o-X Films

Miao-I. Lin,Ming-Hung Tsai,Wan-Jui Shen,Jien-Wei Yeh
DOI: https://doi.org/10.1016/j.tsf.2009.10.142
IF: 2.1
2010-01-01
Thin Solid Films
Abstract:(AlCrTaTiZr)Ox films were deposited at 350°C by DC magnetron sputtering from high-entropy alloy target. Oxygen concentration increases with oxygen flow ratio, and saturates near 67at.%. As-deposited films have an amorphous structure. Their hardness fall in the range of 8–13GPa. All amorphous oxide films maintain their amorphous structure up to 800°C for at least 1h. After 900°C 5h annealing, crystalline phases with the structures of ZrO2, TiO2, or Ti2ZrO6 form. Annealing enhances mechanical properties of the films. Their hardness and modulus attain to the values about 20 and 260GPa, respectively. The resistivity of the metallic films is around 102μΩcm but drastically rises to 1012μΩcm when oxygen concentration increases.
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