Preparation and Characterization of Optically Transparent Ceramic Silicon Nitride Thin Films

CHENG Yun,YANG Minghong,DAI Jixiang,YANG Zhi
DOI: https://doi.org/10.3969/j.issn.1005-023x.2013.02.009
2013-01-01
Abstract:Radio frequency magnetron sputtering method was employed to prepare the micron grade silicon nitride thin film with different sputtering process.Spectroscopic ellipsometry,spectrophotometer,X-ray diffractometer,electron probe microscopic analyzer and infrared spectrometer were used to characterize the film optical properties,microstructure and chemical composition.When the flow ratio of N2 to Ar is controlled at 1∶1,the samples are amorphous,high refractive index and N-rich silicon nitrogen films.The refractive index of the film can be improved by low temperature annealing process.The film transmittance rises with the increase of sputtering pressure,and decreases with the increase of sputtering power.The intensity of N-Si bond can be reduced with higher sputtering pressure.
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