Monolithically Integrated GaN/BST Ultraviolet-Infrared Dual Color Photodetector

Li Xianjie,Zhao Yonglin,Qi Lifang,Yin Shunzheng,Cai Daomin,Wu Chuangui,Zhang Wanli,Li Yanrong
2008-01-01
Abstract:A monolithically integrated GaN/BST ultraviolet-infrared dual color photodetector was realized with wide band gap GaN thin film grown by metal organic chemical vapor deposition(MOCVD)on sapphire and pyroelectronic BaxSr1-xTiO3(BST)thin film grown by magic sputtering.GaN metal-semiconductor-metal(MSM)structure and BST pyroelectronic capacitance structure were used for the ultraviolet sensitive area and the infrared sensitive area respectively.Phosphorus SiO2 was employed between the GaN and BST as the heat-isolating layer.Large area ultraviolet-infrared dual color testing devices and 1×32 and 1×64 linear array devices were fabricated with conventional semiconductor process.The active area for both ultraviolet detector and infrared sensitive cells is 500 μm×500 μm.The peak spectrum wavelength is 360 nm,the cutoff wavelength is 370 nm and the responsivity is 0.08 A/W for the ultraviolet cell.The pyroelectronic coefficient of BST thin film is 1×10-6 C·m-2K-1 while the responsivity is 9.14 V/W and the blackbody detectivity D is 4.37×105 cm·Hz1/2·W-1 for the pyroelectronic infrared cell.
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