Fabrication Techniques of A-Si∶h TFT on Plastic Substrate

姚建可,许宁生,邓少芝,陈军,佘峻聪,王彬
DOI: https://doi.org/10.3969/j.issn.1007-2780.2010.04.018
2010-01-01
Chinese Journal of Liquid Crystals and Displays
Abstract:Bottom gate structure a-Si∶H TFT array was deposited by standard PECVD process at 300 ℃ on Kapton E plastic substrate with thickness of 50 μm.The structure of a-Si∶H film was characterized by IR spectrum.The electrical conductivity of a-Si∶H film and n+ a-Si∶H film is measured by two probes and four probes method,respectively.The H atom is of 15.6% content in a-Si∶H film and mainly appeared in SiH and SiH2 group.The electrical conductivity of a-Si∶H film is 8.2×10-7~8.8×10-6 S/cm,and that of n+ a-Si∶H film is 3.8×10-3 S/cm.The TFTs have a threshold voltage of ~5 V,sub threshold slope of ~2.5 V/dec,linear mobility of ~0.113 cm2/(V·s)and on/off current ratio of ~105.The results show that the a-Si∶H TFTs on plastic substrate fabricated in this process can be used in TFT-LCD and some other switch addressable circuits of flat panel display.
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