Abstract:The La0.7Sr0.3MnO3-delta, thin films were deposited on Si(100) by DC magnetron sputtering followed by annealing at 973 K for 0.5-2 h in air/oxygen. The microstructure, room temperature reflectance and magnetoresistance (MR) of the annealed films were investigated using Glancing angle X-ray diffraction (GXRD), scanning electron microscopy (SEM), Fourier transform infrared spectroscopy (FTIR) analyses and resistivity measurement. The results indicate that the films are single perovskite phase with distorted cubic structure. All the films show (100) preferred orientation and the degree of (100) preferred orientation depends on the annealing time and ambience. The films with highly (100) preferred orientation have a shorter Mn-O bond length. With the increase of temperature, the MR% of the films first decreases slowly in a wide temperature range, then increases and, finally, decreases rapidly. The maximum MR% of the films at 10 K and room temperature is about 73% and 7.9%, respectively. Lengthening annealing time in air cannot ensure the increase of metal-insulator transition temperature (T-MI) of the films. Suitable lengthening of annealing time is propitious to the improvement of temperature stability of magnetoresistance for the films annealed in air. The higher the value T-MI, the lower the room temperature emittance of the films evaluated based on reflectance. (C) 2015 Elsevier Ltd. All rights reserved.

Growth and Annealing of La1.85Sr0.15CuO4+δthin Films on SrTiO3substrates

Morphology and Structure of La1.85Sr0.15CuO4 + Δ Thin Films Deposited on (100) SrTiO3 Substrates by Dc Magnetron Sputtering

Epitaxial growth of Bi 2 Sr 2−x La x CuO 6+δ thin films by RF-magnetron sputtering

The Effect of Annealing on Magnetic and Transport Properties of La0.5sr0.5coo3-Delta Thin Films

Microstructure, Colossal Magnetoresistance Effect and Thermal Infrared Property of Annealed La0.7Sr0.3MnO3−δ Thin Films on Si(100)

Preparation and Structure of La_(0.5)Ca_(0.5)Mn_xTi_(1-x)O_3 Thin Film Deposited by Magneto Controlled Sputtering

The Effect of Thickness on the Structure and Superconductivity of La1.85Sr0.15CuO4 Films

Modulation of Superconductivity and Charge Stripes by Compressive Strain in La1.44nd0.4sr0.16cuo4 Films

The effect of annealing temperature on the structure and dielectric properties of (Ba/sub 0.6/Sr/sub 0.4/)TiO/sub 3/ thin films

Effects of relaxing time on the morphology and structure of La 1.85Sr0.15CuO4+δ thin films

Co-deposition Growth and Superconductivity of La2−xSrxCuO4 Films by Reactive Molecular Beam Epitaxy

Tuning The Magnetic And Transport Properties Of La0.8ca0.2mno3 Films By Ba0.8sr0.2tio3 Intercalated Layers Grown With Polymer-Assisted Deposition

Epitaxial Strain Effects on Superconducting and Transport Properties of La 2-X Sr X CuO 4+Δ

Epitaxial Growth of Differently Doped (caxla1−x)(ba1.75−xla0.25+x)cu3oythin Films Byin Situdc Magnetron Sputtering

Growth and Post-Annealing Studies of Bi2sr2-Xlaxcuo6+Delta (0 <= X <= 1.00) Single Crystals

100 K (bi, Pb)-Sr-Ca-Cu-O Superconducting Films Produced by RF Magnetron Sputtering and Post Annealing

Co-deposition growth and superconductivity of La 2 − x Sr x Cu O 4 films by reactive molecular beam epitaxy

Substrate-dependent Post-Annealing Effects on the Strain State and Electrical Transport of Epitaxial La5/8-yPryCa3/8MnO3 Films

Effect of post-annealing on the structure and dielectric property of La2Ti2O7 thin film

Annealing Assisted Substrate Coherency And High-Temperature Antiferromagnetic Insulating Transition In Epitaxial La0.67ca0.33mno3/Ndgao3(001) Films

EPITAXIAL GROWTH OF La 0.5 Sr 0.5 CoO 3 THIN FILMS AND ITS MECHANISMS