Preparation and Structure of La_(0.5)Ca_(0.5)Mn_xTi_(1-x)O_3 Thin Film Deposited by Magneto Controlled Sputtering

Han Gao-rong
2005-01-01
Abstract:Multi-ferroelectric and magnetoelectric thin films of La_(0.5)Ca_(0.5)MnxTi_(1-x)O_3(LCMTO) were deposited on Si (100) substrate by magneto controlled sputtering under different preparation conditions. X-ray diffraction (XRD), atomic forced microscopy (AFM) and electronic diffraction spectroscopy (EDS) were respectively used to measure the morphologies, phase structures and composition. All the orthorhombic perovskite phases formed initially at heat treatment temperature of about 600 and thoroughly above 850 in the LCMTO thin film deposited on Si (100) substrate. The contents of the perovskite phase in the thin film increased with increasing heat treatment temperature up to 850. The lattice constant of the perovskite phase in LCMTO thin film deposited on Si (100) depended on the heat treatment temperature, thin film thickness and oxygen concentration in vacuum chamber during preparation of the LCMTO thin film which due to the existence of stress between the thin film and silicon substrate.
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