Preparation and structure of La0.5Ca0.5Mnx Ti1-xO3 thin film deposited by magneto controlled sputtering

Piyi Du,Jin Meng,Xuemei Zhou,Wenjian Weng,Gaorong Han
2005-01-01
Abstract:Multi-ferroelectric and magnetoelectric thin films of La0.5Ca0.5Mnx Ti1-xO3 (LCMTO) were deposited on Si(100) substrate by magneto controlled sputtering under different preparation conditions. X-ray diffraction (XRD), atomic forced microscopy (AFM) and electronic diffraction spectroscopy (EDS) were respectively used to measure the morphologies, phase structures and composition. All the orthorhombic perovskite phases formed initially at heat treatment temperature of about 600°C and thoroughly above 850°C in the LCMTO thin film deposited on Si(100) substrate. The contents of the perovskite phase in the thin film increased with increasing heat treatment temperature up to 850°C. The lattice constant of the perovskite phase in LCMTO thin film deposited on Si(100) depended on the heat treatment temperature, thin film thickness and oxygen concentration in vacuum chamber during preparation of the LCMTO thin film which due to the existence of stress between the thin film and silicon substrate.
What problem does this paper attempt to address?