Conditions for the growth of smooth La0.7Sr0.3MnO3 thin films by pulsed electron ablation
Patrizio Graziosi,Mirko Prezioso,Alessandro Gambardella,Catherine Kitts,Rajib Kumar Rakshit,Alberto Riminucci,Ilaria Bergenti,Francesco Borgatti,Chiara Pernechele,Massimo Solzi,Daniele Pullini,David Jeronimo Busquets-Mataix,Valentin Alek Dediu
DOI: https://doi.org/10.1016/j.tsf.2013.02.008
2012-12-28
Abstract:We report on the optimisation of the growth conditions of manganite La0.7Sr0.3MnO3 (LSMO) thin films prepared by Channel Spark Ablation (CSA). CSA belongs to pulsed electron deposition methods and its energetic and deposition parameters are quite similar to those of pulsed laser deposition. The method has been already proven to provide manganite films with good magnetic properties, but the films were generally relatively rough (a few nm coarseness). Here we show that increasing the oxygen deposition pressure with respect to previously used regimes, reduces the surface roughness down to unit cell size while maintaining a robust magnetism. We analyse in detail the effect of other deposition parameters, like accelerating voltage, discharging energy, and temperature and provide on this basis a set of optimal conditions for the growth of atomically flat films. The thicknesses for which atomically flat surface was achieved is as high as about 10-20 nm, corresponding to films with room temperature magnetism. We believe such magnetic layers represent appealing and suitable electrodes for various spintronic devices.
Materials Science,Other Condensed Matter