Effects of relaxing time on the morphology and structure of La 1.85Sr0.15CuO4+δ thin films

Min Zu,Yingzi Zhang,Haihu Wen

DOI: https://doi.org/10.1016/j.physc.2009.11.084

IF: 1.534

2010-01-01

Physica C: Superconductivity and its Applications

Abstract:Relaxing time intervals were introduced into the sputtering deposition procedure of La1.85Sr0.15CuO4+δ thin films for improving the qualities of the thin films. Atomic force microscopy and X-ray diffraction were employed to examine morphology and structure of the epitaxial thin films. Properties of the thin films prepared with and without relaxing time intervals were compared. The study reveals that the inserted relaxing time intervals in deposition improves the surface smoothness of the thin films. Furthermore, the results show that the thicker the thin film, the better the crystalline quality and the superconducting property for both of the deposition procedures.