Strain Relaxation in Epitaxial (pb,sr)tio3 Thin Films on NdGaO3 Substrates

Y. Lin,C. Dai,Y. R. Li,X. Chen,C. L. Chen,A. Bhalla,Q. X. Jia
DOI: https://doi.org/10.1063/1.3357435
IF: 4
2010-01-01
Applied Physics Letters
Abstract:Strain relaxation behavior of (Pb,Sr)TiO3 thin films on (110) NdGaO3 substrates fabricated under different conditions have been investigated using high resolution x-ray diffraction. Dislocation densities and interfacial strain distribution have been systematically studied with samples in different postdeposition cooling rates. Strain relaxation and dislocation evolution are found to be dependent upon the cooling process. The relationship of dielectric properties and the strain and dislocations of the films were discussed.
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