Electron field emission enhancement effects of nano-diamond films

S.G. Wang,Qing Zhang,S.F. Yoon,J. Ahn,Q. Zhou,Q. Wang,D.J. Yang,J.Q. Li,Sam Zhang Shanyong
DOI: https://doi.org/10.1016/S0257-8972(02)00901-5
IF: 4.865
2003-01-01
Surface and Coatings Technology
Abstract:In this paper, electron field emission properties of nano-diamond films, which were prepared using either CH4/H2/N2 or CH4/Ar microwave plasma enhanced chemical vapor deposition, were studied. X-ray photoelectron spectroscopy detection indicates that nitrogen was incorporated into the nano-diamond film grown in CH4/H2/N2 mixture. This nano-diamond film shows a very low threshold electric field of 2.2 V/μm and a high emission current density of 720 μA/cm2 at applied field of 6.4 V/μm. Nitrogen incorporation, high grain boundary density and sp2-bonded non-diamond components in the films are believed to be responsible for the electron emission enhancement.
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