Observation of a Non Fowler–Nordheim Field-Induced Electron Emission Phenomenon from Chemical Vapor Deposited Diamond Films

J Chen,SZ Deng,NS Xu,KH Wu,EG Wang

DOI: https://doi.org/10.1063/1.124681

IF: 4

1999-01-01

Applied Physics Letters

Abstract:A field-induced electron emission phenomenon has been observed from nitrogen-doped diamond films deposited on molybdenum substrates by microwave plasma enhanced chemical vapor deposition using N2/CH4 as feedstock. Their field-induced electron emission characteristics, i.e., current–voltage characteristics and distribution of emission sites, were studied using the transparent anode imaging technique. A repeatable abrupt change of “on” and “off” states of emission was observed at two corresponding specific fields during circling of both increasing and decreasing applied gap fields. A plausible explanation is given to this type of field-induced electron emission phenomenon, in which a two-layer structure consisting of amorphous carbon and diamond is proposed.