Integrated optical filter arrays fabricated by using the combinatorial etching technique.

Shao-Wei Wang,Xiaoshuang Chen,Wei Lu,Li Wang,Yonggang Wu,Zhanshan Wang
DOI: https://doi.org/10.1364/OL.31.000332
IF: 3.6
2006-01-01
Optics Letters
Abstract:A combinatorial etching technique is developed to fabricate integrated narrow bandpass filters on a single substrate. It is highly efficient for fabrication of integrated filter arrays in optical regions. A monolithic filter array has been fabricated by using the technique with a two-step deposition process. The filter contains 32 elements in the near-infrared region. The relative full width at half-maximum (FWHM) delta lambda/lambda of the filter elements is less than 0.2%. Such a narrow bandpass filter array can be utilized in many optical applications. (c) 2006 Optical Society of America.
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