Integrated filter array fabricated by using the combinatorial deposition technique

WANG Shao-wei,LI Ming,XIA Chang-sheng,WANG Hai-qian,CHEN Xiao-shuang,LU Wei
DOI: https://doi.org/10.3969/j.issn.1005-5630.2006.04.025
2006-01-01
Abstract:A combinatorial deposition technique is developed to fabricate integrated filter arrays on a single substrate in high efficiency.An array integrated with 64 narrow band-pass filters(NBPFs) has been successfully fabricated by using a reactive magnetron sputtering system with only a eight-step deposition process,with Nb_2O_5 and SiO_2 as dielectric materials.The total size of the filter array is only 12mm×12mm.The channels of the 64 filter elements distribute almost linearly from 720.5nm to(877.2nm).Their bandwidth is between 1.82nm and 3.92nm.The results show that combinatorial deposition technique is a high-efficient method for the fabrication of integrated filter arrays.
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