Studies on Incorporation of As2 and As4 in III–V Compound Semiconductors with Two Group V Elements Grown by Molecular Beam Epitaxy

ZB Hao,ZY Ren,WP Guo,Y Luo
DOI: https://doi.org/10.1016/s0022-0248(01)01019-3
IF: 1.8
2001-01-01
Journal of Crystal Growth
Abstract:Under the assumption that one incident As4molecule produces one active As2molecule before incorporating into epitaxial alloys, a novel thermodynamic model is developed to describe the molecular beam epitaxy (MBE) growth of III–V compound semiconductors with two group V elements using As4 flux. A parameter εd representing the activation energy of As4 dissociation process is introduced in the model. High quality InAsyP1−y materials were grown on InP substrates using our home made all solid source MBE (SSMBE) system with valved cracker cells under different substrate temperatures and arsenic fluxes with different As2/As4 ratios. By taking into account the As2/As4 ratio, the model is used to calculate the compositions of the grown samples. The calculated results are in good agreement with the experimental data. Both the experiments and the calculations show the lower incorporation efficiency of As4 than that of As2.
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