Abstract:Diamond-like carbon (DLC) films have been grown on a small scale by many researchers. While there are many potential applications of DLC films, a method of growing them on an industrial scale has been lacking. We have developed a low-temperature dc plasma process that is larger than typical lab scale, and can easily be scaled up further. With our unique electrode configuration, a stable dc discharge could be maintained, and highly reproducible films are obtained. Films are also grown on substrates of various geometries. Good films with average thickness of 2 μm were grown on semiconductors, metals, insulators, and plastics. An ionic mechanism dominated the deposition process. Solid state 13C cross polarization magnetic angle spinning nuclear magnetic resonance was used to determine carbon sp2/sp3 ratios which were typically 1.6. Combustion and 15N nuclear reaction tests showed 33 at. % H. X-ray diffraction and transmission electron microscopy were used to check for regions of crystallinity. Infrared spectroscopy was used to confirm C–H bonding. Hardness was measured with a light load microhardness tester (10 g); average hardness was close to SiC. Friction and wear were characterized using standard pin-on-disk measurements; no wear was observed on the film-coated disk, and the coefficient of friction was 0.03–0.07 for film-against-film. The films were resistant to concentrated strong acids and stable to 460 °C in air. Some applications for low friction coatings have been explored.

Preparation of hydrogenated diamond-like carbon films on conductive glass from an organic liquid using pulsed power

Preparation of Anti-Reflective and Protective Diamond-Like Carbon Film on Si Substrate by Femto-Second Pulsed Laser Deposition

Evaluation of Diamond-Like Carbon Films Electrodeposited on an Al Substrate from the Liquid Phase with Pulse-Modulated Power

Electronic-Properties of Semiconducting Diamond-Like Carbon Diamond

Surface morphology of diamond-like carbon films prepared by liquid deposition

Electrodeposition Of Diamond-Like Amorphous Carbon Films On Si From N,N-Dimethylformamide

Structure and Optical Characteristics of DLC Films

Deposition of nano-diamond-like carbon films by an atmospheric pressure plasma gun and diagnostic by optical emission spectrum on the process

Electrodeposition of Diamond-Like Carbon Films from Organic Solvents and Effects of Annealing on the Film Structure

Micro-structure of Diamond-Like Carbon Films Prepared by Liquid Electrodeposition

Evaluation of Carbon Films Electrodeposited on Different Substrates from Different Organic Solvents

Diamond-like carbon film from liquid gas on metallic substrates

The properties of N-doped diamond-like carbon films prepared by helicon wave plasma chemical vapor deposition

Mechanism of high growth rate for diamond-like carbon films synthesized by helicon wave plasma chemical vapor deposition

Micromechanical properties of hydrogenated diamond-like carbon multilayers

Diamond-like Carbon Film on 20 CrNiMo Steel Prepared by Hollow-Cathode Glow Discharge

Diamond‐like carbon films grown by a large‐scale direct current plasma chemical vapor deposition reactor: System design, film characteristics, and applications

Growth of Diamond Thin Films with Smooth Surface and High Transmittance on Quartz Glass Substrates

Diamond-like Carbon Films Deposited by Femtosecond Laser Pulses

Growth and Properties of Diamond-Like Carbon Films on Inner Walls of Polythylene Terephthalate Tube

Diamond-like carbon protective anti-reflection coating for Si solar cell