Abstract:Diamond-like carbon (DLC) films have been grown on a small scale by many researchers. While there are many potential applications of DLC films, a method of growing them on an industrial scale has been lacking. We have developed a low-temperature dc plasma process that is larger than typical lab scale, and can easily be scaled up further. With our unique electrode configuration, a stable dc discharge could be maintained, and highly reproducible films are obtained. Films are also grown on substrates of various geometries. Good films with average thickness of 2 μm were grown on semiconductors, metals, insulators, and plastics. An ionic mechanism dominated the deposition process. Solid state 13C cross polarization magnetic angle spinning nuclear magnetic resonance was used to determine carbon sp2/sp3 ratios which were typically 1.6. Combustion and 15N nuclear reaction tests showed 33 at. % H. X-ray diffraction and transmission electron microscopy were used to check for regions of crystallinity. Infrared spectroscopy was used to confirm C–H bonding. Hardness was measured with a light load microhardness tester (10 g); average hardness was close to SiC. Friction and wear were characterized using standard pin-on-disk measurements; no wear was observed on the film-coated disk, and the coefficient of friction was 0.03–0.07 for film-against-film. The films were resistant to concentrated strong acids and stable to 460 °C in air. Some applications for low friction coatings have been explored.

Diamond-like carbon film from liquid gas on metallic substrates

Preparation of Anti-Reflective and Protective Diamond-Like Carbon Film on Si Substrate by Femto-Second Pulsed Laser Deposition

Deposition of nano-diamond-like carbon films by an atmospheric pressure plasma gun and diagnostic by optical emission spectrum on the process

Surface morphology of diamond-like carbon films prepared by liquid deposition

Diamond‐like carbon films grown by a large‐scale direct current plasma chemical vapor deposition reactor: System design, film characteristics, and applications

Diamond-Like Carbon Thin Films Deposited On Ti6al4v Alloy Surface By Plasma Gun At Atmospheric Pressure

Electronic-Properties of Semiconducting Diamond-Like Carbon Diamond

Diamond-like Carbon Film on 20 CrNiMo Steel Prepared by Hollow-Cathode Glow Discharge

Structure and Optical Characteristics of DLC Films

Deposition of Diamond-Like Carbon on Inner Surface by Hollow Cathode Discharge

Wear-resistance of Diamond-like Carbon Thin Films Deposited on the Metal Seal Ring Surface by Plasma Gun at an Atmospheric Pressure

Preparation of hydrogenated diamond-like carbon films on conductive glass from an organic liquid using pulsed power

Multilayer Diamond‐Like Carbon Films on Monocrystalline Diamond

Evaluation of Diamond-Like Carbon Films Electrodeposited on an Al Substrate from the Liquid Phase with Pulse-Modulated Power

Deposition of DLC Film on Stainless Steel Substrates Coated by Nickel Using PECVD Method

Growth and nucleation of diamond-like carbon (DLC) film on aluminum

Deposition of Diamond-Like Carbon Films Using Hollow Cathode Plasma Source

Deposition of Diamond-like Carbon films using Dense Plasma Focus

Diamond-Like Carbon Thin-Film Deposition Using A Magnetically Confined Rf Pecvd System

Micro-structure of Diamond-Like Carbon Films Prepared by Liquid Electrodeposition

Growth and Properties of Diamond-Like Carbon Films on Inner Walls of Polythylene Terephthalate Tube