Gan-Based Light Emitting Diodes With Periodic Nano-Structures On The Surface Fabricated By Nanoimprint Lithography Technique

Yoshiki Naoi,Masakazu Matsumoto,Tianya Tan,Mistuaki Tohno,Shiro Sakai,Atsuyuki Fukano,Satoru Tanaka
DOI: https://doi.org/10.1002/pssc.200983486
2010-01-01
Abstract:We investigated the characteristics of GaN-based light emitting diodes (LEDs) with periodic nano-structures on the surface by nanoimprint lithography technique. We measured the intensity emitted through nano-structure on the p-GaN surface into the forward side in an air/GaN-LED/sapphire configuration, and also the intensity through nano-structure fabricated between GaN/sapphire interfaces into the back side. Angular spatial distribution of electroluminescence intensity from GaN-based 380 nm UV and 410 nm blue LED with nano-structures were considerably different from that for the sample without nano processing, and the lobe near the horizontal direction in the surface side profile was observed. The results can be explained by a combination of diffracted light by the fabricated grating by NIL and transmitted light though the sidewall at the interface of the periodic structure. (c) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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