Abstract:It is demonstrated that cuprous oxide (Cu2O) can be electrodeposited epitaxially onto silicon (Si) and indium phosphide (InP) (001) single‐crystalline substrates from aqueous solution. Epitaxial electrodeposition under these conditions is remarkable considering the strong driving force for the formation of amorphous native oxide layers on Si and InP substrates. To elucidate the growth mechanisms, the microstructure of the interfaces between the Cu2O layer and the two different substrates was investigated by TEM (transmission electron microscopy) in conjunction with XEDS (X‐ray energy‐dispersive spectroscopy) and EELS (electron energy‐loss spectroscopy). In both heteroepitaxial systems, the Cu2O layers have a unique but non‐trivial crystallographic orientation relationship (OR) with the substrate, which can be described as a 45° rotation around the common [001] axis representing the substrate normal. We show that this relationship minimizes the overall misfit between corresponding interatomic spacings of the two adjacent crystals. In apparent contradiction to the unique OR, TEM revealed that in both hetero‐systems the Cu2O layer is separated from the substrate by an amorphous interlayer. The thickness of the interlayer typically is a few nanometers. The presence of an amorphous interlayer contrasts with our experimental results on electrodeposited Cu2O on Au (001) single‐crystal substrates, also included in this article, where TEM shows the Cu2O epilayer in direct contact with the substrate. XEDS and EELS analysis of the chemical composition and bonding at Cu2O/Si and Cu2O/InP interfaces in the as‐grown state as well as after tempering revealed that the interlayer is mainly composed of SiO2 and InPO4, respectively. Most likely, the observed epitaxial layers on top of an amorphous interlayer evolve by nucleation of epitaxial Cu2O directly on the substrate. While simultaneous oxidation of the substrate leads to the formation of an amorphous layer, the epitaxial nuclei can laterally overgrow the oxide. Consequently, the local composition of the amorphous layer varies with the nature of the substrate.

Influence of Cl- on the Morphology of Cu2O Films in Electrodeposition Processing

Morphological Control of Cu2O Micro-Nanostructure Film by Electrodeposition

Effect of solution concentration on surface morphology, chemical composition and photoresponse of CuO/Cu 2 O composite thin films grown by hydrothermal synthesis

Effects and Mechanism of ITO and ZnO Substrate on Surface Morgraphology and Structural of Electrodeposited Cu2O Thin Films

Electrodeposition of Cu2O Films and Their Photoelectrochemical Properties

Morphology Evolutions and Optical Properties of Cu2O Films by an Electrochemical Deposition on Flexible Substrate

The Effect of Additives on the Cu2O Crystal Morphology in Acetate Bath by Electrodeposition

The Effect of Complexing Agents on the Oriented Growth of Electrodeposited Microcrystalline Cuprous Oxide Film

Influence of different temperatures and pH on structural, morphological, and electrochemical properties of Cu2O thin films by electrodeposition in acidic media

Effect of CuI Layer on Photoelectrochemistry of Cu2O Films

Modulation of Dendrite Growth of Cuprous Oxide by Electrodeposition

Effects of Bath Temperature and Substrate on Surface Morphology of Electrodeposited Cu2O Thin Films

Electrodeposition and Optical Properties of Highly Oriented Γ-Cui Thin Films

Effect of Conductive Substrate (working Electrode) on the Morphology of Electrodeposited Cu2O

Controllable morphology and conductivity of electrodeposited Cu₂O thin film: effect of surfactants.

Morphology-controlled electrodeposition of Cu 2O microcrystalline particle films for application in photocatalysis under sunlight

Epitaxial Electrodeposition of Cu2o Films Onto Inp(001)

EPITAXIAL GROWTH OF CUPROUS OXIDE ELECTRODEPOSITED ONTO SEMICONDUCTOR AND METAL SUBSTRATES

Composition and Morphology of CuInSe2 Thin Films by Electrodeposition

Influence of Deposition Temperature on Growth Process and Opto-electronic Performance of Cu2O Thin Films

Electrodeposition and Characterization of Nanocrystalline Cuprous Oxide Thin Films on Tio2 Films