Abstract:It is demonstrated that cuprous oxide (Cu2O) can be electrodeposited epitaxially onto silicon (Si) and indium phosphide (InP) (001) single‐crystalline substrates from aqueous solution. Epitaxial electrodeposition under these conditions is remarkable considering the strong driving force for the formation of amorphous native oxide layers on Si and InP substrates. To elucidate the growth mechanisms, the microstructure of the interfaces between the Cu2O layer and the two different substrates was investigated by TEM (transmission electron microscopy) in conjunction with XEDS (X‐ray energy‐dispersive spectroscopy) and EELS (electron energy‐loss spectroscopy). In both heteroepitaxial systems, the Cu2O layers have a unique but non‐trivial crystallographic orientation relationship (OR) with the substrate, which can be described as a 45° rotation around the common [001] axis representing the substrate normal. We show that this relationship minimizes the overall misfit between corresponding interatomic spacings of the two adjacent crystals. In apparent contradiction to the unique OR, TEM revealed that in both hetero‐systems the Cu2O layer is separated from the substrate by an amorphous interlayer. The thickness of the interlayer typically is a few nanometers. The presence of an amorphous interlayer contrasts with our experimental results on electrodeposited Cu2O on Au (001) single‐crystal substrates, also included in this article, where TEM shows the Cu2O epilayer in direct contact with the substrate. XEDS and EELS analysis of the chemical composition and bonding at Cu2O/Si and Cu2O/InP interfaces in the as‐grown state as well as after tempering revealed that the interlayer is mainly composed of SiO2 and InPO4, respectively. Most likely, the observed epitaxial layers on top of an amorphous interlayer evolve by nucleation of epitaxial Cu2O directly on the substrate. While simultaneous oxidation of the substrate leads to the formation of an amorphous layer, the epitaxial nuclei can laterally overgrow the oxide. Consequently, the local composition of the amorphous layer varies with the nature of the substrate.

EPIR Effect of Cu2O Films by Electrochemical Deposition

Electrochemical Deposition and EPIR Effects of Cu_2O Film

Effect of CuI Layer on Photoelectrochemistry of Cu2O Films

Effect of pH on the electrodeposition nucleation and growth mechanism of cuprous oxide

EPITAXIAL GROWTH OF CUPROUS OXIDE ELECTRODEPOSITED ONTO SEMICONDUCTOR AND METAL SUBSTRATES

Epitaxial Electrodeposition of Cu2o Films Onto Inp(001)

Influence of different temperatures and pH on structural, morphological, and electrochemical properties of Cu2O thin films by electrodeposition in acidic media

Electrodeposition of Cu2O Films and Their Photoelectrochemical Properties

Epitaxil Electrodeposition Of A Crystalline Metal Oxide Onto Single-Crystalline Silicon

Effects and Mechanism of ITO and ZnO Substrate on Surface Morgraphology and Structural of Electrodeposited Cu2O Thin Films

Effect of Conductive Substrate (working Electrode) on the Morphology of Electrodeposited Cu2O

Morphology Evolutions and Optical Properties of Cu2O Films by an Electrochemical Deposition on Flexible Substrate

Electrodeposition of Phase–Pure n–Type Cu 2 O: Role of Electrode Reactions and Local pH

Studies of the Solution Ph on Structure and Photoelectric Properties of Cu2O Films Prepared by Electrodeposition

Electrodeposition of AgCuO2 Nanoplates

Morphology and Microstructure of Epitaxial Cu(001) Films Grown by Primary Ion Deposition on Si and Ge Substrates

Influence of solution pH dependency on structure, optical with photoelectrochemical characteristics of SILAR deposited copper oxide thin films

In-Depth Study of Chemically Electrodeposited Cuprous Oxide (Cu2O) thin Films on ITO Glass

Novel application of electrochemical test for the controllable electrodeposition of Cu 2 O and metallic Cu film

Resistance Switching Properties of Cu2s Film by Electrochemical Deposition

The Effect of Complexing Agents on the Oriented Growth of Electrodeposited Microcrystalline Cuprous Oxide Film