Effect of Cu content in CIGSe absorber on MoSe2 formation during post-selenization process

Jinlian Bi,Jianping Ao,Liyong Yao,Yi Zhang,Guozhong Sun,Wei Liu,Fangfang Liu,Wei Li
DOI: https://doi.org/10.1016/j.mssp.2020.105275
IF: 4.1
2021-01-01
Materials Science in Semiconductor Processing
Abstract:<p>MoSe<sub>2</sub> layers, which would help to form ohmic contact and improve the adhesion, were formed at the Mo/CIGSe interface during the CIGSe preparing process. However, a thick MoSe<sub>2</sub> layer could introduce carrier recombination center, high contact resistance, and might result in poor adhesion of CIGSe films, which played a deleterious role in the efficiency of the devices. In this study, the effect of Cu content and Ga diffusion on the formation of MoSe<sub>2</sub> layer was investigated. The thick MoSe<sub>2</sub> layer tended to form with Cu/(In + Ga) &lt; 0.7, and MoSe<sub>2</sub> was difficult to form at the Mo/CIGSe interface when Cu/(In + Ga) &gt; 0.9. Finally, CIGSe thin film with large grains and a thin MoSe<sub>2</sub> layer was obtained with the value of Cu/(In + Ga) between 0.8 and 0.9, and an 11.04% efficiency CIGSe solar cell was fabricated with the open circuit voltage of 505 mV.</p>
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied
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