Electrocrystallization in pulse electrolysis

N. Ibl,J.Cl. Puippe,H. Angerer
DOI: https://doi.org/10.1016/0376-4583(78)90044-4
1978-03-01
Surface Technology
Abstract:After a brief survey of the literature on pulse electrolysis the theory of the method is reviewed. Two diffusion layers build up: a pulsating one near the electrode and a stationary one further away. Extremely high pulse current densities (c.d.) (up to 250 A cm-2) can be applied because the pulsating diffusion layer can be made very thin. Under these conditions no powder was formed at the limiting current, in agreement with theory. This was confirmed for Cu, Cd and Ag. A systematic study was also made below the limiting current. The three independent parameters of pulse electrolysis (pulse c.d., pulse length and cut-off time between two pulses) were varied within a wide range in the deposition of Cd (from an acid sulfate bath) and of Au (from a citric acid-cyanide bath with a Co additive). Each of the three parameters strongly influence the properties studied (crystal size of Cd, amount of codeposited C and Co, current efficiency and porosity in the case of Au). Pulse electrolysis appears to have great potential for obtaining electrodeposits with a wide range of properties.
What problem does this paper attempt to address?