Abstract:Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of free-form curvilinear mask shapes that enhance printed wafer image quality and process window. However, a major challenge in implementing curvilinear ILT for large-scale production is mask rule checking, an area currently under development by foundries and EDA vendors. Although recent research has incorporated mask complexity into the optimization process, much of it focuses on reducing e-beam shots, which does not align with the goals of curvilinear ILT. In this paper, we introduce a GPU-accelerated ILT algorithm that improves not only contour quality and process window but also the precision of curvilinear mask shapes. Our experiments on open benchmarks demonstrate a significant advantage of our algorithm over leading academic ILT engines.

What problem does this paper attempt to address?

The problem that this paper attempts to solve is: **In semiconductor manufacturing, how to optimize mask design through inverse lithography technology (ILT) to generate high - quality curved mask shapes, thereby improving the quality of printed wafer images and the process window, and meeting the requirements of curved mask rule checking**. Specifically, the paper mainly focuses on the following aspects: 1. **Limitations of existing methods**: - Traditional optical proximity correction (OPC) methods rely on heuristic rules to adjust the edges of chip design polygons. However, as the feature size of chips shrinks, the robustness of this method is limited, resulting in a longer design cycle and a decline in production yield. - Although existing ILT methods can provide a wider solution space through free - form optimization, they face the challenges of complex mask production in actual manufacturing, especially the problems of curved mask generation and rule checking. 2. **Challenges of Curvy ILT**: - Curvy ILT aims to generate smooth curved mask shapes, but most of the existing research focuses on reducing the number of electron - beam exposures, which is inconsistent with the goals of Curvy ILT. - Curvy ILT needs to solve the problem of mask rule check (MRC) to ensure that the generated mask meets the manufacturing requirements. 3. **Solutions in the paper**: - A GPU - accelerated ILT algorithm is proposed. This algorithm not only improves the contour quality and the process window but also improves the accuracy of the curved mask shape. - The **curvilinear design retargeting (CDR)** technology is introduced. By smoothing the corner points of the original Manhattan design, the optimization target becomes more reasonable and over - optimization is avoided. - A **differentiable morphological operator** is developed, which can control the curvature and shape of the mask during the optimization process without affecting the quality of the final result (QoR). 4. **Experimental verification**: - Experiments on public benchmark datasets show that this algorithm is significantly superior to existing academic ILT engines in multiple evaluation metrics, especially in terms of edge placement error (EPE), process variation band (PVB), and minimum shape area (MSA). In conclusion, through the introduction of new algorithms and techniques, this paper solves the mask rule - checking and manufacturing challenges faced by Curvy ILT in large - scale production, thereby improving the quality and efficiency of mask design.

GPU-Accelerated Inverse Lithography Towards High Quality Curvy Mask Generation

GPU-accelerated Inverse Lithography Technique

Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application

Efficient ILT via Multi-level Lithography Simulation.

Regularized Level-Set-based Inverse Lithography Algorithm for IC Mask Synthesis

A Gradient-Based Inverse Lithography Technology For Double-Dipole Lithography

A New Algorithm of Inverse Lithography Technology for Mask Complexity Reduction

Mask Synthesis for 65nm SRAM Manufacturing Using Gradient-Based Inverse Lithography Technology (ILT)

Laser Direct Writing Technology for Printing Mesh on Convex Surface

Double-dipole mask-synthesis using inverse lithography technology

A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement with Attenuated Phase Shift Mask

DIRECT: An Efficient Optimization Scheme for Mask Generation Using Inverse Lithography

Object-based mask synthesis algorithm using inverse lithography technique for 65nm-node technology

Inverse Lithography Physics-informed Deep Neural Level Set for Mask Optimization

A highly efficient optimization algorithm for pixel manipulation in inverse lithography technique

Block-based inverse lithography technology with adaptive level-set algorithm

Algorithm Optimization and Mask Data Generating for Dammann Gratings in Laser Medical Applications

Mask Synthesis for Aerial Image Fidelity in Optical Lithography Using A Coarse-Grid-Approximation Level-Set Approach

ILT Approach for Compensating 3-D Mask Effects

A composite algorithm of lithography process in AlGaN/GaN-on-SiC HEMTs manufacturing

From Computational Lithography to Computational Inspection: Inverse Lithography Technology (ILT) and Inverse Inspection Technology (IIT)