ILT Approach for Compensating 3-D Mask Effects

Xiong Wei,Zhang Jinyu,Min-Chun Tsai,Wang Yan,Yu Zhiping

DOI: https://doi.org/10.1016/s1007-0214(09)70009-4

2009-01-01

Abstract:As mask features scale to smaller dimensions, the so-called “3-D mask effects” which have mostly been neglected before, become important. This paper properly models the 3-D thick mask effects, and then analyses the object-based inverse lithography technique using a simulated annealing algorithm to determine the mask shapes that produce the desired on-wafer results. Evaluations against rigorous simulations show that the synthesized masks provide good image fidelity up to 0.94, and this approach gives improved accuracy and faster results than existing methods.