Abstract:For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been recognized by the industry as the key technology needed to drive lithographic performance. This implies not only simultaneous co-optimization of all the lithographic enhancement tricks that have been learned over the years, but that they also be pushed to the limit by powerful computational techniques and systems. Inspection presents another great challenge; Most mask rules are imposed not because of mask manufacturing constraints, but due to limitations of mask inspection tools. In addition, at the most advanced technology nodes, such as 32nm and 22nm, aggressive OPC and Sub-Resolution Assist Features (SRAFs), ILT, and SMO are required. Their use results in significantly increased mask complexity, making mask defect inspection and disposition more challenging than ever. In this paper, a single computational lithography and computational inspection framework based on Level Set Method is presented and explained in non-mathematical language. Results at the 32nm node and below are presented which demonstrate the benefits of Level-Set-Method-based ILT and IIT in design rule optimization, SMO, full-chip correction, and mask inspection.

Object-based mask synthesis algorithm using inverse lithography technique for 65nm-node technology

Mask Synthesis for 65nm SRAM Manufacturing Using Gradient-Based Inverse Lithography Technology (ILT)

Double-dipole mask-synthesis using inverse lithography technology

ILT Approach for Compensating 3-D Mask Effects

Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application

Regularized Level-Set-based Inverse Lithography Algorithm for IC Mask Synthesis

Mask Synthesis for Aerial Image Fidelity in Optical Lithography Using A Coarse-Grid-Approximation Level-Set Approach

A Gradient-Based Inverse Lithography Technology For Double-Dipole Lithography

A highly efficient optimization algorithm for pixel manipulation in inverse lithography technique

Efficient ILT via Multi-level Lithography Simulation.

DIRECT: An Efficient Optimization Scheme for Mask Generation Using Inverse Lithography

A highly effective and efficient cost-function-reduction method for inverse lithography technique

A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement with Attenuated Phase Shift Mask

Block-based inverse lithography technology with adaptive level-set algorithm

Inverse Lithography Physics-informed Deep Neural Level Set for Mask Optimization

Efficient Mask Design for Inverse Lithography Technology Based on 2D Discrete Cosine Transformation (DCT)

From Computational Lithography to Computational Inspection: Inverse Lithography Technology (ILT) and Inverse Inspection Technology (IIT)

A New Algorithm of Inverse Lithography Technology for Mask Complexity Reduction

GPU-Accelerated Inverse Lithography Towards High Quality Curvy Mask Generation

An analytic gradient-based inverse lithography approach for partially-coherent double-exposure lithography

Source and Mask Co-Optimization Using A Gradient Based Method in Optical Lithography