Abstract:For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been recognized by the industry as the key technology needed to drive lithographic performance. This implies not only simultaneous co-optimization of all the lithographic enhancement tricks that have been learned over the years, but that they also be pushed to the limit by powerful computational techniques and systems. Inspection presents another great challenge; Most mask rules are imposed not because of mask manufacturing constraints, but due to limitations of mask inspection tools. In addition, at the most advanced technology nodes, such as 32nm and 22nm, aggressive OPC and Sub-Resolution Assist Features (SRAFs), ILT, and SMO are required. Their use results in significantly increased mask complexity, making mask defect inspection and disposition more challenging than ever. In this paper, a single computational lithography and computational inspection framework based on Level Set Method is presented and explained in non-mathematical language. Results at the 32nm node and below are presented which demonstrate the benefits of Level-Set-Method-based ILT and IIT in design rule optimization, SMO, full-chip correction, and mask inspection.

A Gradient-Based Inverse Lithography Technology For Double-Dipole Lithography

Double-dipole mask-synthesis using inverse lithography technology

DIRECT: An Efficient Optimization Scheme for Mask Generation Using Inverse Lithography

An analytic gradient-based inverse lithography approach for partially-coherent double-exposure lithography

Mask Synthesis for 65nm SRAM Manufacturing Using Gradient-Based Inverse Lithography Technology (ILT)

Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application

Efficient Mask Design for Inverse Lithography Technology Based on 2D Discrete Cosine Transformation (DCT)

Efficient ILT via Multi-level Lithography Simulation.

Object-based mask synthesis algorithm using inverse lithography technique for 65nm-node technology

Seamless-merging-oriented Parallel Inverse Lithography Technology

L2O-ILT: Learning to Optimize Inverse Lithography Techniques

GPU-Accelerated Inverse Lithography Towards High Quality Curvy Mask Generation

A highly efficient optimization algorithm for pixel manipulation in inverse lithography technique

A highly effective and efficient cost-function-reduction method for inverse lithography technique

Inverse Lithography Physics-informed Deep Neural Level Set for Mask Optimization

From Computational Lithography to Computational Inspection: Inverse Lithography Technology (ILT) and Inverse Inspection Technology (IIT)

Laser Direct Writing System and Its Lithography Properties

Regularized Level-Set-based Inverse Lithography Algorithm for IC Mask Synthesis

A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement with Attenuated Phase Shift Mask

Block-based inverse lithography technology with adaptive level-set algorithm

A Robust Pixel-Based RET Optimization Algorithm Independent of Initial Conditions