Abstract:For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been recognized by the industry as the key technology needed to drive lithographic performance. This implies not only simultaneous co-optimization of all the lithographic enhancement tricks that have been learned over the years, but that they also be pushed to the limit by powerful computational techniques and systems. Inspection presents another great challenge; Most mask rules are imposed not because of mask manufacturing constraints, but due to limitations of mask inspection tools. In addition, at the most advanced technology nodes, such as 32nm and 22nm, aggressive OPC and Sub-Resolution Assist Features (SRAFs), ILT, and SMO are required. Their use results in significantly increased mask complexity, making mask defect inspection and disposition more challenging than ever. In this paper, a single computational lithography and computational inspection framework based on Level Set Method is presented and explained in non-mathematical language. Results at the 32nm node and below are presented which demonstrate the benefits of Level-Set-Method-based ILT and IIT in design rule optimization, SMO, full-chip correction, and mask inspection.

Efficient ILT via Multi-level Lithography Simulation.

Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application

Simulation and Experimental Investigation of Immersion Flow Field in Immersion Lithography

Seamless-merging-oriented Parallel Inverse Lithography Technology

L2O-ILT: Learning to Optimize Inverse Lithography Techniques

A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement with Attenuated Phase Shift Mask

Regularized Level-Set-based Inverse Lithography Algorithm for IC Mask Synthesis

From Computational Lithography to Computational Inspection: Inverse Lithography Technology (ILT) and Inverse Inspection Technology (IIT)

A Gradient-Based Inverse Lithography Technology For Double-Dipole Lithography

GPU-Accelerated Inverse Lithography Towards High Quality Curvy Mask Generation

A highly effective and efficient cost-function-reduction method for inverse lithography technique

Object-based mask synthesis algorithm using inverse lithography technique for 65nm-node technology

Block-based inverse lithography technology with adaptive level-set algorithm

Mask Synthesis for 65nm SRAM Manufacturing Using Gradient-Based Inverse Lithography Technology (ILT)

A highly efficient optimization algorithm for pixel manipulation in inverse lithography technique

A Fast OPC Algorithm for IC Layout Based on 1-D Cells after Optimization of Gap Distribution

A composite algorithm of lithography process in AlGaN/GaN-on-SiC HEMTs manufacturing

Inverse Lithography Physics-informed Deep Neural Level Set for Mask Optimization

ILT Approach for Compensating 3-D Mask Effects

Light and Matter Co-Confined Multi-Photon Lithography

DIRECT: An Efficient Optimization Scheme for Mask Generation Using Inverse Lithography