Abstract:High quality (Q) factor microdisks are fundamental building blocks of on-chip integrated photonic circuits and biological sensors. The resonant modes in microdisks circulate near their boundaries, making their performances strongly dependent upon surface roughness. Surface-tension-induced microspheres and microtoroids are superior to other dielectric microdisks when comparing Q factors. However, most photonic materials such as silicon and negative photoresists are hard to be reflowed and thus the realizations of high-Q microdisks are strongly dependent on electron-beam lithography. Herein, we demonstrate a robust, cost-effective, and highly reproducible technique to fabricate ultrahigh-Q microdisks. By using silica microtoroids as masks, we have successfully replicated their ultrasmooth boundaries in a photoresist via anisotropic dry etching. The experimentally recorded Q factors of passive microdisks can be as large as 1.5 × 106. Similarly, ultrahigh Q microdisk lasers have also been replicated in dye-doped polymeric films. The laser linewidth is only 8 pm, which is limited by the spectrometer and is much narrower than that in previous reports. Meanwhile, high-Q deformed microdisks have also been fabricated by controlling the shape of microtoroids, making the internal ray dynamics and external directional laser emissions controllable. Interestingly, this technique also applies to other materials. Silicon microdisks with Q > 106 have been experimentally demonstrated with a similar process. We believe this research will be important for the advances of high-Q micro-resonators and their applications.

Focused ion beam polishing based optimization of high-Q silica microdisk resonators

Fabrication of Optical Cavities with Femtosecond Laser Pulses

Monolithic Integration of a High-Quality Factor Lithium Niobate Microresonator with a Free-Standing Membrane Waveguide Using Femtosecond Laser Assisted Ion Beam Writing (FLAIBW)

Monolithic Integration of a Lithium Niobate Microresonator with a Free-Standing Waveguide Using Femtosecond Laser Assisted Ion Beam Writing.

Research on Silica Microdisk by Wet-etching

Fabrication of SiO2 Microdisk Optical Resonator

Fabrication of Ultra-High Q Silica Microdisk Using Chemo-Mechanical Polishing

Single-Mode Silicon-On-Insulator Elliptical Microdisk Resonators with High Q Factors

Dry-etched Ultrahigh-Q Silica Microdisk Resonators on a Silicon Chip

High-Q Silica Microdisk Optical Resonators with Large Wedge Angles on a Silicon Chip

Silica-based microcavity fabricated by wet etching

Single-Polarization Fiber-Pigtailed High-Finesse Silica Waveguide Ring Resonator for A Resonant Micro-Optic Gyroscope

High-Q and highly reproducible microdisks and microlasers.

Optical Quality Improvement of Si Photonic Devices Fabricated by Focused-Ion-Beam Milling

High Finesse Silica Waveguide Ring Resonators for Resonant Micro-Optic Gyroscopes

Universal light-guiding geometry for high-nonlinear resonators having molecular-scale roughness

Integration of fiber coupled high-Q silicon nitride microdisks with atom chips

Waveguide Integrated Deuterated Silicon Nitride (SiN:D) Microdisk Resonators for Nonlinear Photonics

Lithium niobate micro-disk resonators of quality factors above 10^7

Optical Frequency Comb in Silicon Nitride Microresonator(invited)

Fabrication of high quality factor lithium niobate double-disk using a femtosecond laser