A Novel Substrate-Baseplate Structure for Medium Voltage SiC MOSFET Device

Kai Gao,Laili Wang,Dingkun Ma,Lei Li,Guochun Xiao,Peiyuan Sun,Jiacheng Guo,Tianshu Yuan
DOI: https://doi.org/10.1109/cieec60922.2024.10583728
2024-05-10
Abstract:This study presents a novel substrate-baseplate structure tailored for medium-voltage SiC MOSFET devices. The proposed configuration combines an asymmetric DBC substrate with a metal baseplate featuring voids, creating a sealed cavity that achieves phase-change heat spreading. This innovative design significantly improves the thermal dissipation efficiency of the device while effectively reducing common-mode capacitance. Additionally, the application of a low CTE polyimide film on the substrate ensures compliance with the 10kV voltage rating. Simulation and experimental results robustly validate the exceptional electrothermal performance of the proposed structure. In comparison to conventional substrate-baseplate configurations under identical DBC upper copper traces, the proposed structure demonstrates a 56.41% reduction in common-mode capacitance and a 13-degree decrease in the maximum junction temperature at a single-chip heating power of 30W.
Materials Science,Physics,Engineering
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