A Novel SiC Trench MOSFET Structure with Enhanced Short Circuit Robustness

Chongyu Jiang,Hongyi Xu,Na Ren,Qing Guo,Kuang Sheng
DOI: https://doi.org/10.1109/wipdaasia51810.2021.9656039
2021-01-01
Abstract:In this paper, a novel SiC trench MOSFET (TMOS) structure N-implanted TMOS is proposed and compared with previous P-implanted TMOS. Specific on-resistance (Rdson, sp), breakdown voltage (BV), and maximum electric field in gate oxide (Eox_max) were optimized by using numerical simulation. It was found the optimal N-implanted TMOS has a 390V higher breakdown voltage than optimal P-implanted TMOS under similar Rdson, sp. However, Eox_max in N-implanted TMOS is higher than P-implanted TMOS under the same blocking voltage. Further, short circuit (SC) simulations were studied under bus voltage of 400 V/800 V. The peak short circuit current (normalized with current rating @Vds = 2 V) and energy dissipations were compared for the two devices with varied designs. Both the peak short circuit current and energy dissipation are lower for the N-implanted TMOS at the same SC pulse width. The N-implanted TMOS device have better short circuit robustness.
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