Abstract:High quality (Q) factor microdisks are fundamental building blocks of on-chip integrated photonic circuits and biological sensors. The resonant modes in microdisks circulate near their boundaries, making their performances strongly dependent upon surface roughness. Surface-tension-induced microspheres and microtoroids are superior to other dielectric microdisks when comparing Q factors. However, most photonic materials such as silicon and negative photoresists are hard to be reflowed and thus the realizations of high-Q microdisks are strongly dependent on electron-beam lithography. Herein, we demonstrate a robust, cost-effective, and highly reproducible technique to fabricate ultrahigh-Q microdisks. By using silica microtoroids as masks, we have successfully replicated their ultrasmooth boundaries in a photoresist via anisotropic dry etching. The experimentally recorded Q factors of passive microdisks can be as large as 1.5 × 106. Similarly, ultrahigh Q microdisk lasers have also been replicated in dye-doped polymeric films. The laser linewidth is only 8 pm, which is limited by the spectrometer and is much narrower than that in previous reports. Meanwhile, high-Q deformed microdisks have also been fabricated by controlling the shape of microtoroids, making the internal ray dynamics and external directional laser emissions controllable. Interestingly, this technique also applies to other materials. Silicon microdisks with Q > 106 have been experimentally demonstrated with a similar process. We believe this research will be important for the advances of high-Q micro-resonators and their applications.

Ar/Cl$_{2}$ etching of GaAs optomechanical microdisks fabricated with positive electroresist

High-Q Optomechanical GaAs Nanomembranes

Dry etching of deep air holes in GaAs/AlGaAs-based epi-wafer having InAs quantum dots for fabrication of photonic crystal laser

Soft-mask fabrication of gallium arsenide nanomembranes for integrated quantum photonics

Demonstration of High-Performance, Sub-Micron Chalcogenide Glass Photonic Devices by Thermal Nanoimprint

Optomechanical cavities based on epitaxial GaP on nominally (001)-oriented Si

Fabrication and Analysis of a Fabry-Perot Cavity with a Micromechanical Wet-Etching Process.

Ultrahigh Q-Frequency product for optomechanical disk resonators with a mechanical shield

Atomic layer etching of SiO$_2$ using sequential exposures of Al(CH$_3$)$_3$ and H$_2$/SF$_6$ plasma

Fabrication of Ultra-High-q Ta2O5 Microdisks by Photolithography-Assisted Chemo-Mechanical Etching

Silica-based microcavity fabricated by wet etching

Smooth and Vertical Etching of GaAs/GaInP/AlGaInP Using Inductively Coupled Cl2/BCl3/CH4 Plasma

High-Q and highly reproducible microdisks and microlasers.

Fabrication of Submicron Devices on the (011) Cleave Surface of a Cleaved-Edge-overgrowth GaAs/AlGaAs Crystal

Selective Dry Etching of GaAs/AlAs Based on SiCl4/SF6 Mixtures by ICP

Fabrication of microstructures on GaAs with pulsed electrochemical wet stamping

InGaAs Quantum Dot Molecules During Selective Etching Using an in Droplet Mask

Fabrication of Ultra-High Q Silica Microdisk Using Chemo-Mechanical Polishing

Development of Micron Sized Photonic Devices Based on Deep GaN Etching

Optomechanical microgear cavity

Laser Direct Writing for Micromachining of Freeform Surface on n-Type GaAs via Photoelectrochemical Etching