Conductivity Anisotropy in Epitaxial 6H and 4H Sic

William J. Schaffer,G. H. Negley,K. G. Irvine,J. W. Palmour
DOI: https://doi.org/10.1557/proc-339-595
1994-01-01
MRS Proceedings
Abstract:ABSTRACT A measure of the electron mobility anisotropy in n-type 4H and 6H-SiC has been obtained using the Hall effect over the temperature range 80K<T<600K. Hall mobility and resistivity data are collected from appropriately oriented bar patterns fabricated into high quality epitaxial material grown on (1 1 00) or (11 2 0)surfaces having total impurity concentrations 10 17 -10 18 cm -3 . The observed mobility ratio for 4H is μ [11 2 0] / [0001] and is independent of temperature. For 6H, the ratio μ[1 1 00]/[0001] decreases from ∼6.2 at 80K to ∼5.0 at 150K and is essentially constant (∼4.8) above 200K. A donor level near 0.6 eV is occasionally observed in 4H which reduces the high temperature electron mobility and introduces an apparent temperature dependence to the mobility ratio if nonuniformly distributed.
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