Determining layer number of two-dimensional flakes of transition-metal dichalcogenides by the Raman intensity from substrates

Xiaoli Li,X. Qiao,W. Han,Xin Zhang,Qinghai Tan,Tao Chen,P. Tan
DOI: https://doi.org/10.1088/0957-4484/27/14/145704
IF: 3.5
2016-02-17
Nanotechnology
Abstract:Transition-metal dichalcogenide (TMD) semiconductors have been widely studied due to their distinctive electronic and optical properties. The property of TMD flakes is a function of their thickness, or layer number (N). How to determine the N of ultrathin TMD materials is of primary importance for fundamental study and practical applications. Raman mode intensity from substrates has been used to identify the N of intrinsic and defective multilayer graphenes up to N = 100. However, such analysis is not applicable to ultrathin TMD flakes due to the lack of a unified complex refractive index ( n ˜ ?> ) from monolayer to bulk TMDs. Here, we discuss the N identification of TMD flakes on the SiO2/Si substrate by the intensity ratio between the Si peak from 100 nm (or 89 nm) SiO2/Si substrates underneath TMD flakes and that from bare SiO2/Si substrates. We assume the real part of n ˜ ?> of TMD flakes as that of monolayer TMD and treat the imaginary part of n ˜ ?> as a fitting parameter to fit the experimental intensity ratio. An empirical n ˜ , ?> namely, n ˜ eff , ?> of ultrathin MoS2, WS2 and WSe2 flakes from monolayer to multilayer is obtained for typical laser excitations (2.54 eV, 2.34 eV or 2.09 eV). The fitted n ˜ eff ?> of MoS2 has been used to identify the N of MoS2 flakes deposited on 302 nm SiO2/Si substrate, which agrees well with that determined from their shear and layer-breathing modes. This technique of measuring Raman intensity from the substrate can be extended to identify the N of ultrathin 2D flakes with N-dependent n ˜ . ?> For application purposes, the intensity ratio excited by specific laser excitations has been provided for MoS2, WS2 and WSe2 flakes and multilayer graphene flakes deposited on Si substrates covered by a 80–110 nm or 280–310 nm SiO2 layer.
Materials Science
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