Photochemical modification of a diamond surface using a pulsed UV laser as the energy source

Mariana Silva,Nádia E. Santos,Mariana Pinto,Samuel Guieu,Ricardo Oliveira,Flávio Figueira,Filipe A. Almeida Paz,Miguel Neto,Luis Rino,Jonas Deuermeier,Milan Maradiya,Michael Liehr,Joana C. Mendes,Susana S. Braga
DOI: https://doi.org/10.1016/j.diamond.2024.111314
IF: 3.806
2024-06-21
Diamond and Related Materials
Abstract:The use of an excimer benchtop pulsed UV laser as the energy source for the photochemical modification of the surface of diamond films is reported. Boron-doped nanocrystalline diamond (NCD) films were deposited on Si wafers via plasma-enhanced chemical vapour deposition (PECVD). The as-deposited films were characterised by scanning electron microscopy (SEM), Raman spectroscopy, and X-ray diffraction (XRD). Following characterisation, the surfaces of the films were subjected to a photochemical reaction with 2,2,2-trifluoroethyl undec-10-enoate using two different sources of radiation: a benchtop UV lamp (254 nm) and a KrF excimer pulsed UV laser (248 nm). The photochemically treated films were characterised by contact angle measurements and X-ray photoelectric spectroscopy (XPS) using non-treated films as a control. The use of a pulsed UV laser source was shown to reduce the photochemical reaction time from several hours to a few minutes.
materials science, multidisciplinary,physics, applied, condensed matter, coatings & films
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