Highly Transparent Nanocrystalline Diamond Films On Quartz Substrates

Dongjiang Qiu,Chengru Shi,Huizhen Wu
DOI: https://doi.org/10.3321/j.issn:1000-3290.2002.08.042
IF: 0.906
2002-01-01
Acta Physica Sinica
Abstract:Highly transparent diamond films are successfully achieved on quartz via the radio-freguency plasma-enhanced hot-filament chemical vapor deposition (RF-HFCVD) process. Optical transmission spectra, scanning electron microscopy (SEM), surface profile, as well as x-ray diffraction (XRD) and Raman scattering spectroscopy are employed to characterize the as-grown films. The effects of substrate temperature, reaction gas pressure, and RF power on the structural and optical properties of the prepared films are studied. Their optimal values are 700degreesC, 2 x 133Pa and 200W, respectively. After growth for 1h at the optimal deposition parameters, the nanocrystalline, diamond film can always be obtained with its grain size of about 25nm, its average surface roughness of about 5.5nm, and its optical transmission greater than 90% in the near-IR region.
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