On the Understanding and Modeling of Non-Negligible Subthreshold-State Degradation (SSD) in Sub-20-nm DRAM Technology
Da Wang,Yongkang Xue,Yong Liu,Pengpeng Ren,Zixuan Sun,Zirui Wang,Zhijun Cheng,Haiyang Yang,Xiangli Liu,Blacksmith Wu,Kanyu Cao,Zhigang Ji,Runsheng Wang,Ru Huang
DOI: https://doi.org/10.1109/led.2024.3425860
IF: 4.8157
2024-08-28
IEEE Electron Device Letters
Abstract:Based on the sub-20-nm DRAM technology, the peripheral transistors under stress in the subthreshold-state degradation (SSD) are investigated for the first time. A completely new phenomenon, two-stage degradation, is observed, which can not only exhibit large degradation even comparable to channel hot carrier (CHC) stress mode but also introduce severe device-to-device variation. The novel mechanism of positive-feedback-induced second-impact-ionization is revealed as the root causing such an issue. Based on the understanding, a defect-based two-stage new model is proposed and validated. Since SSD can occur during every AC switching, they must be taken into consideration in future device- and circuit-level reliability assessments.
engineering, electrical & electronic