Large‐area Growth of Ferroelectric Two‐dimensional Γ‐In2Se3 Semiconductor by Spray Pyrolysis for Next‐Generation Memory

Taebin Lim,Jae Heon Lee,Donggyu Kim,Jinbaek Bae,Seungchae Jung,Sang Mo Yang,Joon I. Jang,Jin Jang
DOI: https://doi.org/10.1002/adma.202308301
IF: 29.4
2023-11-08
Advanced Materials
Abstract:In2Se3, two‐dimensional (2D) ferroelectric‐semiconductor, is a promising candidate for next‐generation memory device because of its outstanding electrical properties. However, the large‐area manufacturing of In2Se3 is still a big challenge. In this work, we introduce spray pyrolysis technique for the growth of large‐area In2Se3 thin‐film. A polycrystalline γ‐In2Se3 layer could be grown on 15 cm × 15 cm glasss at the substrate temperature of 275 °C. The In2Se3 ferroelectric‐semiconductor field effect transistor (FeS‐FET) on glass substrate demonstrates a large hysteresis window of 40.3 V at the ±40 V of gate voltage sweep and excellent uniformity. The FeS‐FET exhibits an electron field effect mobility of 0.97 cm2/Vs and an on/off current ratio of > 107 in the transfer curves. We demonstrated the memory behavior of the large area, In2Se3 FeS‐FETs for next‐generation memory. This article is protected by copyright. All rights reserved
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
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