Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry
Michael Tanksalvala,Christina L. Porter,Yuka Esashi,Bin Wang,Nicholas W. Jenkins,Zhe Zhang,Galen P. Miley,Joshua L. Knobloch,Brendan McBennett,Naoto Horiguchi,Sadegh Yazdi,Jihan Zhou,Matthew N. Jacobs,Charles S. Bevis,Robert M. Karl Jr.,Peter Johnsen,David Ren,Laura Waller,Daniel E. Adams,Seth L. Cousin,Chen-Ting Liao,Jianwei Miao,Michael Gerrity,Henry C. Kapteyn,Margaret M. Murnane
DOI: https://doi.org/10.1126/sciadv.abd9667
2024-03-29
Abstract:Next-generation nano and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical- and phase-sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms. This tabletop microscope can non-destructively probe surface topography, layer thicknesses, and interface quality, as well as dopant concentrations and profiles. High-fidelity imaging was achieved by implementing variable-angle ptychographic imaging, by using total variation regularization to mitigate noise and artifacts in the reconstructed image, and by using a high-brightness, high-harmonic source with excellent intensity and wavefront stability. We validate our measurements through multiscale, multimodal imaging to show that this technique has unique advantages compared with other techniques based on electron and scanning-probe microscopies.
Optics,Applied Physics,Instrumentation and Detectors