Non-Destructive, High-Resolution, Chemically Specific, 3D Nanostructure Characterization using Phase-Sensitive EUV Imaging Reflectometry

Michael Tanksalvala,Christina L. Porter,Yuka Esashi,Bin Wang,Nicholas W. Jenkins,Zhe Zhang,Galen P. Miley,Joshua L. Knobloch,Brendan McBennett,Naoto Horiguchi,Sadegh Yazdi,Jihan Zhou,Matthew N. Jacobs,Charles S. Bevis,Robert M. Karl Jr.,Peter Johnsen,David Ren,Laura Waller,Daniel E. Adams,Seth L. Cousin,Chen-Ting Liao,Jianwei Miao,Michael Gerrity,Henry C. Kapteyn,Margaret M. Murnane

DOI: https://doi.org/10.1126/sciadv.abd9667

2024-03-29

Abstract:Next-generation nano and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical- and phase-sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms. This tabletop microscope can non-destructively probe surface topography, layer thicknesses, and interface quality, as well as dopant concentrations and profiles. High-fidelity imaging was achieved by implementing variable-angle ptychographic imaging, by using total variation regularization to mitigate noise and artifacts in the reconstructed image, and by using a high-brightness, high-harmonic source with excellent intensity and wavefront stability. We validate our measurements through multiscale, multimodal imaging to show that this technique has unique advantages compared with other techniques based on electron and scanning-probe microscopies.

Optics,Applied Physics,Instrumentation and Detectors

What problem does this paper attempt to address?

The problem that this paper attempts to solve is to develop a non - destructive, high - resolution, chemically - specific 3D nanostructure characterization technique. Specifically, the paper presents a new phase - sensitive extreme ultraviolet (EUV) imaging reflectometer, aiming to solve the problem of non - destructive testing of complex 3D structures in next - generation nano - and quantum devices. The performance of these devices is often affected by interface quality or precise chemical composition. Especially when the size of these devices is reduced to the nanoscale, traditional characterization techniques are difficult to meet the requirements.

By combining the excellent phase stability of the coherent high - order harmonic source, the unique chemical and phase sensitivity of extreme ultraviolet reflectivity, and the advanced ptychography imaging algorithm, the paper achieves non - destructive detection of surface topography, layer thickness, interface quality, doping concentration and distribution. This method can provide high - fidelity imaging without special sample preparation, and can verify its measurement results through multi - scale and multi - modal imaging, showing the unique advantages of this technique over other techniques based on electron and scanning probe microscopes.

Overall, this research aims to fill the gaps in current characterization techniques, especially for the need for non - destructive, non - contact imaging techniques to determine interface and layer structures, surface morphology, and sensitivity to doping distribution and material composition.