First Demonstration of High-Sensitivity (Nep<1fw•hz-1/2) Back-Illuminated Active-Matrix Deep UV Image Sensor by Monolithic Integration of Ga2O3 Photodetectors and Oxide Thin-Film-Transistors

Yuan Qin,Congyan Lu,Zhaoan Yu,Zhihong Yao,Feihong Wu,Danian Dong,Xiaolong Zhao,Guangwei Xu,Yuhao Zhang,Shibing Long,Ling Li,Ming Liu
DOI: https://doi.org/10.1109/vlsitechnologyandcir46769.2022.9830520
2022-01-01
Abstract:We, for the first time, demonstrated a back-illuminated active-matrix deep UV (DUV) image sensor by monolithically integrating an ultra-wide bandgap (UWBG) Ga 2 O 3 photodetector (PD) array and IGZO thin-film-transistors (TFT) based on a low temperature back-end-of-line (BEOL) process. Benefited from the low off-state current of 10 -13 A, high on/off ratio of 5×10 8 , and high stability of IGZO TFTs, the integrated PD/TFT sensor cell presents super-high sensitivity with NEP down to 1fW•Hz -1/2 with a high responsivity and specific detectivity of 302A/W and 1.7×10 15 Jones, respectively. The 32×32 DUV image sensor shows excellent uniformity and demonstrates a superior image recognition ability with light intensity down to 2 μW/cm 2 . This scalable, high-resolution DUV image sensor shows great promise for advanced imaging and machine vision applications.
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