Ultimate Limit in Optoelectronic Performances of Monolayer WSe 2 Sloping-Channel Transistors

Zhengdao Xie,Guoli Li,Shengxuan Xia,Chang Liu,Sen Zhang,Zhouxiaosong Zeng,Xingqiang Liu,Denis Flandre,Zhiyong Fan,Lei Liao,Xuming Zou
DOI: https://doi.org/10.1021/acs.nanolett.3c01866
IF: 10.8
2023-07-12
Nano Letters
Abstract:Atomically thin monolayer two-dimensional (2D) semiconductors with natural immunity to short channel effects are promising candidates for sub-10 nm very large-scale integration technologies. Herein, the ultimate limit in optoelectronic performances of monolayer WSe(2) field-effect transistors (FETs) is examined by constructing a sloping channel down to 6 nm. Using a simple scaling method compatible with current micro/nanofabrication technologies, we achieve a record high saturation current up to...
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
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