In-plane Schottky-barrier field-effect transistors with a 4-nm channel based on 1T/2H MoTe<sub>2</sub> and WTe<sub>2</sub>

Houping Yang,Yueyue Tian,Junjun Li,Yiqun Xie,Wei Ren,Yin Wang
DOI: https://doi.org/10.1063/5.0054348
IF: 1.697
2021-01-01
AIP Advances
Abstract:As state-of-the-art fabrication techniques are approaching the 3 nm size, the traditional silicon-based circuit faces huge challenges. Transistors based on two-dimensional (2D) materials have attracted much attention as potential alternative candidates. However, critical performances including the subthreshold swing (SS), on/off ratio, and magnitude of the on-state current for 2D transistors around 3 nm size are far less to be studied well. In this work, we propose in-plane Schottky-barrier field-effect transistors (SBFETs) with a 4-nm channel based on the lateral heterostructure of monolayer 1T/2H MoTe2 and WTe2. The electric transport properties are investigated by first-principles quantum transport simulations. At a 0.64 V bias, the WTe2 SBFET has an on-state current of 3861 mu A/mu m, with a 4.5 x 10(4) on/off ratio and an SS of 87 mV/dec, while the MoTe2 SBFET has an on-state current of 1480 mu A/mu m, with a large on/off rate of 3.6 x 10(5) and an SS of 78 mV/dec. Our results suggest that FETs based on the lateral heterostructure of 1T/2H MoTe2 (WTe2) are promising candidates for high-performance 2D transistors.
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