Reduction of contact resistance by selective contact doping in fullerene n-channel organic field-effect transistors

Sanjeev Singh,Swagat K. Mohapatra,Asha Sharma,Canek Fuentes-Hernandez,Stephen Barlow,Seth R. Marder,Bernard Kippelen
DOI: https://doi.org/10.1063/1.4802237
IF: 4
2013-04-15
Applied Physics Letters
Abstract:We have investigated the contact-doping effect on high performance n-channel C60 organic field-effect transistors (OFETs) using the air-stable rhodocene dimer as an n-type dopant. The average charge mobility improved from a value of 0.48 cm2/(Vs) in a reference device to 1.65 cm2/(Vs) for contact-doped devices with a channel length of 25 μm. The operational stability of contact-doped OFETs under continuous stress bias was found similar to the reference devices.
physics, applied
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