Performance of normally off hydrogen-terminated diamond field-effect transistor with Al2O3/CeB6 gate materials
Zhang Minghui,Wang Wei,Chen Genqiang,Xie Rui,Wen Feng,Lin Fang,Wang Yanfeng,Zhang Pengfei,Wang Fei,He Shi,Liang Yuesong,Fan Shuwei,Wang Kaiyue,Yu Cui,Min Tai,Wang Hongxing
DOI: https://doi.org/10.1063/5.0185805
IF: 2.877
2024-03-25
Journal of Applied Physics
Abstract:In this work, we demonstrate a hydrogen-terminated diamond (H-diamond) field-effect transistor (FET) with Al2O3/CeB6 gate materials. The CeB6 and Al2O3 films have been deposited by electron beam evaporation technique, sequentially. For the 4/8/12/15 μm gate length (LG) devices, the whole devices demonstrate distinct p-type normally off characteristics, and all the threshold voltage are negative; all the absolute values of leakage current density are 10−4 A/cm2 at a VGS of −11 V, exhibiting a relatively low leakage current density compared with CeB6 FETs, and this further demonstrates the feasibility of the introduction of Al2O3 to reduce the leakage current density; the maximum drain–source current density is −114.6, −96.0, −80.9, and −73.7 mA/mm, which may be benefited from the well-protected channel. For the 12 μm LG devices, the saturation carrier mobility is 593.6 cm2/V s, demonstrating a good channel transport characteristic. This work may provide a promising strategy for the application of normally off H-diamond FETs significantly.
physics, applied