Penumbuhan Graphene A Study of the Effect of Thermal Annealing on the Morphology Surface and Grain Size of Thin Copper Films as Catalyst for Graphene Growth

Jurusan Fisika Fakultas
Abstract:The effect of thermal annealing on the morphology surface and grain size of thin copper films was studied. The purpose of this study is to find an optimal annealing condition in obtaining a copper catalyst, having a smooth surface with a large grain size. Such catalyst is potential to grow a high quality graphene film. In this work, the copper film (99.99+ % purity; 500 nm thick) was employed by varying annealing temperature (450-900 °C), annealing time (0-1200 min) and hydrogen flow rate (0-100 sccm). These copper catalysts were further studied by means of XRD, SEM and EDS analysis to know their structural properties. XRD results revealed that this copper film has a good nanocrystalline cubic structure, dominated by (111) plane. SEM results showed that the 900 Cannealed copper film has larger grain size (~ 1.3 μm) than the others. EDS analysis showed the presence of copper oxide peaks on the annealed copper under hydrogen-free atmosphere, indicating the importance of hydrogen gas for removing the copper oxide impurities. Based on those studies above, the optimal annealing condition for obtaining a copper substrate with the smooth surface and large grain size is by annealing at 450 °C for 20 hours under hydrogen flow rate of 50 sccm.
Materials Science
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