Fabrication and characterization of magnetron sputtered SAC305 thin films

M. Ojha,Y. Mohammed,M.A. Mamun,D.S. Stone,A.A. Elmustafa
DOI: https://doi.org/10.1016/j.matlet.2024.136329
IF: 3
2024-03-22
Materials Letters
Abstract:This study investigates the surface morphology, mechanical properties including the strain rate sensitivity of the hardness in indentation creep, and electrical resistivity of SAC05 (96.5 %Sn-3 %Ag-0.5 %Cu) thin films sputtered onto Si and SiO 2 substrates using RF and DC magnetron. Various deposition parameters, including DC and RF powers and pressures, were optimized for a continuous and robust film. Among the 16 samples analyzed, the optimal surface was obtained at RF 200 W and 0.32 Pa pressure, as confirmed by FE-SEM. Before polishing, the film exhibited a rough surface with an average grain size of ∼1 μm a thickness of ∼2 μm. Post-polishing, the film displayed a uniform 1.5 μm thickness and a mean surface roughness (Ra) of 14.9 nm. The electrical resistivity of SAC305 on the SiO 2 substrate was 19.6 μΩ.cm, while the strain rate sensitivity, m , for SAC305 on the Si substrate was 0.12 ± 0.02.
materials science, multidisciplinary,physics, applied
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