Hydrogen Plasma Treated p-GaN Gate HEMTs Integration for DC-DC Converter

Fan Li,Ang Li,Shiqiang Wu,Weisheng Wang,Yuhao Zhu,Guohao Yu,Zhongming Zeng,Baoshun Zhang,Jiangmin Gu,Wen Liu
DOI: https://doi.org/10.1109/led.2024.3442853
IF: 4.8157
2024-10-04
IEEE Electron Device Letters
Abstract:This letter presents a monolithic integrated circuit (IC) platform based on the p-GaN gated HEMT technology with a hydrogen plasma treatment (H-treated) process. A 48 V DC-DC power conversion at a switching frequency of 1 MHz is realized. The peripheral enhancement/depletion (E/D-) mode devices formed circuit components, and monolithically integrated with the power device. This is the first H-treated p-GaN platform for the monolithic GaN mixed-signal power IC, the D-mode device will employ the H-treated p-GaN layer as the gate dielectric, with no additional insulator layer. The corresponding ASM-HEMT models have been calibrated for the computer-aided circuit design. Excellent agreement between simulation and static/dynamic experimental results have also been verified with inverters and comparators.
engineering, electrical & electronic
What problem does this paper attempt to address?